中文简介
1983年，原《真空科学与技术杂志》拆分后，创办了《真空科学与技术杂志A》和《真空科学与技术杂志B》。JVSTA致力于出版关于材料、薄膜和等离子体的界面和表面的原始研究报告、信件和评论文章。JVSTA发布的报告在基本层面上促进了对接口和表面的基本理解，并使用这种理解促进了各种技术应用程序中的最新技术。范围包括但不限于以下主题:应用和基础表面科学原子层沉积电子和光子材料及其加工磁性薄膜和界面用于能量转换和储存的材料和薄膜光伏，包括无机和有机薄膜太阳能电池等离子体科学与技术，包括等离子体-表面相互作用、等离子体诊断、等离子体沉积和蚀刻以及等离子体在微电子和纳米电子领域的应用表面工程薄膜沉积、蚀刻、性质及特性透射电镜，包括原位法摩擦学真空科学与技术
英文简介
In 1983, the two journals, Journal of Vacuum Science and Technology A and B were launched when the original Journal of Vacuum Science and Technology was split.JVSTA is devoted to publishing reports of original research, letters, and review articles on interfaces and surfaces of materials, thin films, and plasmas. JVSTA publishes reports that advance the fundamental understanding of interfaces and surfaces at a fundamental level and that use this understanding to advance the state of the art in various technological applications. The scope includes, but is not limited to, the following topics:Applied and fundamental surface scienceAtomic layer depositionElectronic and photonic materials and their processingMagnetic thin films and interfacesMaterials and thin films for energy conversion and storagePhotovoltaics, including inorganic and organic thin-film solar cellsPlasma science and technology, including plasma-surface interactions, plasma diagnostics plasma deposition and etching, and applications of plasmas to micro- and nanoelectronicsSurface engineeringThin film deposition, etching, properties, and characterizationTransmission electron microscopy, including in situ methodsTribologyVacuum science and technology
近年期刊自引率趋势图
JCR分区
| JCR分区等级 | JCR所属学科 | 分区 | 影响因子 |
| Q2 | PHYSICS, APPLIED | Q2 | 3.234 |
| MATERIALS SCIENCE, COATINGS & FILMS | Q3 |
近年期刊影响因子趋势图
CiteScore数值
| CiteScore | SJR | SNIP | 学科类别 | 分区 | 排名 | 百分位 |
| 4.40 | 0.676 | 0.992 | 大类：Materials Science 小类：Surfaces, Coatings and Films | Q2 | 44 / 129 |
66% |
| 大类：Materials Science 小类：Surfaces and Interfaces | Q2 | 20 / 57 |
65% |
|||
| 大类：Materials Science 小类：Condensed Matter Physics | Q2 | 147 / 415 |
64% |
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